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دانلود رایگان مقاله آی اس آی درخواستی( Free DOWNLOAD ISI Papers )،بانک و مرجع مقالات علمی و تخصصی، پروژه، دریافت و دانلود رایگان+مجلات و نشریات آی اس آی - Deposition of aluminum oxide by evaporative coating at atmospheric pressure (ECAP)
 
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Abstract

The Center for Plasma-Material Interaction (CPMI) has developed innovative coating method of evaporative coating at atmospheric pressure (ECAP). This new idea is an atmospheric-pressure-based process. Following the similar concept as the laser-assisted plasma coating at atmospheric pressure (LAPCAP) [1], the material captured by the plasma plume is atomic in nature (the evaporated metal atom) and should therefore end up deposited molecule-by-molecule as in a PVD fashion. By using the thermal energy from the microwave plasma, solid 99.99% + purity aluminum were evaporated and then produce a PVD-like alumina coating on a work piece. The aluminum target was inserted in the center of the microwave torch feeding a melt pool and evaporated into the surrounding plasma plume. A bottle neck was made in the antenna and could reduce the heat loss by 84%, thus allowing higher temperatures to exist in the sample-holder antenna tip. Gas shielding was used to keep the work gas pure. The film was deposited as Al2O3 using oxygen from the environment. Deposition rate was around 2 μm/min. Gas flow rate around the antenna tip was about 0.9 m/s, and the temperature of the plasma was about 1400 °C at 1350 W input power from simulations. Alpha and other metastable phases of aluminum oxide were found on the deposited films.

Keywords

  • Aluminum oxide;
  • Atmospheric pressure;
  • Plasma;
  • Evaporative coating;
  • Microwave;
  • Plasma jet
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نوع مطلب : درباره مقالات ISI، درباره مقالات انگلیسی، مقالات ISI، مقالات انگلیسی، 
برچسب ها : Abstract The Center for Plasma-Material Interaction (CPMI) has developed innovative coating method of evaporative coating at atmospheric pressure (ECAP). This new idea is an atmospheric-pressure-based process. Following the similar concept as the laser-assisted plasma coating at atmospheric pressure (LAPCAP) [1]، the material captured by the plasma plume is atomic in nature (the evaporated metal atom) and should therefore end up deposited molecule-by-molecule as in a PVD fashion. By using the thermal energy from the microwave plasma، solid 99.99% + purity aluminum were evaporated and then produce a PVD-like alumina coating on a work piece. The aluminum target was inserted in the center of the microwave torch feeding a melt pool and evaporated into the surrounding plasma plume. A bottle neck was made in the antenna and could reduce the heat loss by 84%، thus allowing higher temperatures to exist in the sample-holder antenna tip. Gas shielding was used to keep the work gas pure. The film was deposited as Al2O3 using oxygen from the environment. Deposition rate was around 2 μm/min. Gas flow rate around the antenna tip was about 0.9 m/s، and the temperature of the plasma was about 1400 °C at 1350 W input power from simulations. Alpha and other metastable phases of aluminum oxide were found on the deposited films. Keywords Aluminum oxide; Atmospheric pressure; Plasma; Evaporative coating; Microwave; Plasma jet،
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سه شنبه 14 شهریور 1396 03:55 ق.ظ
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چهارشنبه 23 فروردین 1396 01:03 ب.ظ
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